04780747 is referenced by 95 patents and cites 10 patents.

A projection exposure apparatus includes illuminating means for applying energy rays to a mask having a predetermined pattern formed thereon, a projection optical system for forming the image of the pattern in a predetermined projected state on a responsive substrate, adjusting means for correcting the fluctuation of the projected state of the image caused by the passage of the energy rays, exposure control means for controlling the energy rays so that the pojected image of the pattern by the projection optical system is transferred onto the responsive substrate under a predetermined exposure condition, means for making information regarding the reflectivity of the responsive substrate, and main control means for controlling the adjusting means on the basis of the predetermined exposure condition of the exposure control means and the information regarding the reflectivity.

Title
Projection exposure apparatus
Application Number
7/9261
Publication Number
4780747
Application Date
January 30, 1987
Publication Date
October 25, 1988
Inventor
Hideo Mizutani
Tokyo
JP
Hidemi Kawai
Yokohama
JP
Kazuaki Suzuki
Tokyo
JP
Agent
Shapiro and Shapiro
Assignee
Nippon Kogaku
JP
IPC
G03B 27/52
G03B 27/80
G03B 27/74
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