04726963 is referenced by 58 patents and cites 48 patents.

A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing germanium and a halogen and an active species (B) formed from a chemical substance for film formation which is reactive with said active species (A) separately from each other, then irradiating them with light energy and thereby allowing both the species to react with each other thereby to form a deposited film on the substrate.

Title
Process for forming deposited film
Application Number
829928
Publication Number
4726963
Application Date
June 9, 1987
Publication Date
February 23, 1988
Inventor
Isamu Shimizu
Yokohama
JP
Shunri Oda
Tokyo
JP
Masahiro Kanai
Tokyo
JP
Shigeru Ohno
Yokohama
JP
Shunichi Ishihara
Ebina
JP
Agent
Fitzpatrick Cella Harper & Scinto
Assignee
Canon Kabushiki Kaisha
JP
IPC
B05D 3/06
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