04693777 is referenced by 108 patents and cites 7 patents.

An apparatus for producing semiconductor devices in which a plurality of treatment chambers such as a load chamber, an etching chamber, a sputtering chamber, an ion implantation chamber, a CVD chamber, an unload chamber, a transfer chamber, a heat-treatment chamber, a rinsing chamber and the like, are connected in series preferably in the form of U for effecting various treatments of semiconductor wafers. Wafer conveyor and transfer means are provided to move a wafer through the treatment chambers in which the wafer is normally sequentially processed and these conveyor and transfer means are reversible so that a wafer which has been moved into a predetermined treatment chamber can be returned to the inlet of the apparatus, whereby the quantity of dust attached to the wafer in each treatment chamber can be easily and positively detected. In the heat-treatment chamber, the hot air is discharged against the upper surface of the wafer on the belt conveyor while a vertically movable heating plate is brought into contact with the undersurface of the wafer so that the uniform heat-treatment can be accomplished within a short period of time. Furthermore, the inner surfaces of the etching chamber or the like are lined with detachable linings made of, for instance, aluminum so that maintenance is facilitated.

Title
Apparatus for producing semiconductor devices
Application Number
6/802468
Publication Number
4693777
Application Date
November 27, 1985
Publication Date
September 15, 1987
Inventor
Noboru Suzuki
Chigasaki
JP
Munenori Iwami
Yokohama
JP
Reiichiro Sensui
Sagamihara
JP
Hidetaka Jyo
Sagamihara
JP
Masahiro Shibagaki
San Jose
CA, US
Shigeki Hazano
Yokohama
JP
Agent
Schwartz Jeffery Schwaab Mack Blumenthal & Evans
Assignee
Kabushiki Kaisha Tokuda Seisakusho
JP
Kabushiki Kaisha Toshiba
JP
IPC
C03C 15/00
C23F 1/02
B44C 1/22
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