04673799 is referenced by 8 patents and cites 7 patents.

A fluidized bed heater for uniformly raising the surface temperature of semiconductor wafers. The heater includes a mantle having at least one planar surface for supporting wafers, a bed of particles adjacent the mantle which is fluidized by passing a gas through the particle bed, and a bed heater which heats the bed particles to a uniform temperature so that wafers supported on the planar surface are heated to a uniform temperature. A reactor is also described which contains a reactor chamber for processing semiconductor wafers and a fluidized bed heater for uniformly heating semiconductor wafers in the reactor chamber.

Title
Fluidized bed heater for semiconductor processing
Application Number
6/707262
Publication Number
4673799
Application Date
March 1, 1985
Publication Date
June 16, 1987
Inventor
Imad Mahawili
Sunnyvale
CA, US
Agent
Richard Franklin
Steven F Caserza
Alan H MacPherson
Assignee
Focus Semiconductor Systems
CA, US
IPC
C23C 16/44
C23C 16/48
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