04664939 is referenced by 167 patents and cites 2 patents.

A vertical processor for the continuous deposition of semiconductor alloy material by glow discharge techniques. The vertical processor includes a plurality of operatively interconnected deposition chambers, at least one chamber of which includes a generally vertical cathode plate about each of the opposed faces of which a plasma region is developed and a substrate continuously passes for the deposition of semiconductor alloy material thereonto. Through the utilization of the vertical deposition scenario, the length of the processor may be substantially foreshortened, power consumption may be substantially decreased and feedstock gases may be more efficiently utilized.

Title
Vertical semiconductor processor
Application Number
718571
Publication Number
4664939
Application Date
March 10, 1986
Publication Date
May 12, 1987
Inventor
Herbert Ovshinsky
Oak Park
MI, US
Agent
Lawrence G Norris
Marvin S Siskind
Assignee
Energy Conversion Devices
MI, US
IPC
B05D 3/06
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