04622094 is referenced by 50 patents and cites 10 patents.

Dry etching is carried out in such a manner that a periodical potential is applied to an electrode having a workpiece thereon, the above potential changes substantially linearly at a first part of each period and has a reverse polarity at a second part of each period, the linear change of potential at the first part compensates for a change in surface potential of the workpiece to keep constant an ion accelerating voltage between a plasma and the surface of the workpiece, and the potential of the reverse polarity at the second part allows charged particle of the reverse polarity to impinge on the workpiece, thereby neutralizing the electric charge on the surface of the workpiece. Accordingly, the energy of ion incident on the workpiece is distributed in a narrow range around a desired value, and thus an etching rate and a selection ratio can be improved.

Title
Method of controlling dry etching by applying an AC voltage to the workpiece
Application Number
6/680838
Publication Number
4622094
Application Date
December 12, 1984
Publication Date
November 11, 1986
Inventor
Toru Otsubo
Fujisawa
JP
Agent
Antonelli Terry & Wands
Assignee
Hitachi
JP
IPC
H01L 21/306
View Original Source