04591540 is referenced by 20 patents and cites 3 patents.

According to this process two partial patterns which, if superimposed upon each other in a predetermined alignment relative to each other yield the desired pattern, with elements of both partial patterns combining to form elements of the pattern, and these partial pattern elements overlapping sectionally, are projected with a suitable radiation onto the radiation-sensitive layers. Overlapping is achieved in that when designing the two partial patterns a pattern corresponding to the desired pattern is used as a basis in that the elements of this pattern are exposed to a negative windage, the negative windage pattern is subsequently partitioned into two negative windage patterns corresponding to the partial patterns, and finally the negative windage partial pattern elements are exposed to a positive windage to the desired size of the partial pattern elements.

The method is used in particular when a pattern is to be transferred by means of hole masks, and if it is necessary, e.g. because the pattern shows annular elements, to use instead of one mask only two complementary masks each comprising at least one part of the pattern.

Title
Method of transferring a pattern into a radiation-sensitive layer
Application Number
6/603020
Publication Number
4591540
Application Date
April 23, 1984
Publication Date
May 27, 1986
Inventor
Johann Greschner
Pliezhausen
DE
Peter Vettiger
Langnau
CH
Peter Nehmiz
Stuttgart
DE
Helmut Engelke
Altdorf
DE
Erwin Bretscher
Rapperswil
CH
Harald Bohlen
Ammerbuch
DE
Agent
Wolmar J Stoffel
Assignee
International Business Machines Corporation
NY, US
IPC
G03C 5/00
G03F 9/00
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