04579618 is referenced by 272 patents and cites 7 patents.

Plasma processing is accomplished with an improved single electrode reactor apparatus. High and low frequency power supplies are coupled to the single electrode to provide increased process flexibility, control and residue removal. A multi-stage passive filter network is disclosed which performs the functions of coupling both power supplies to the electrode, isolating the low frequency power supply from the high frequency power supply and attenuating the undesired frequencies produced by mixing of the two frequencies in the non-linear load represented by the reactor.

Title
Plasma reactor apparatus
Application Number
568859
Publication Number
4579618
Application Date
October 29, 1984
Publication Date
April 1, 1986
Inventor
Gary B Powell
Petaluma
CA, US
Stephen E Hilliker
Petaluma
CA, US
Georges J Gorin
Pinole
CA, US
Salvatore A Celestino
Novato
CA, US
Agent
Paul F Wille
Assignee
Tegal Corporation
CA, US
IPC
C23F 1/02
C03C 25/06
C03C 15/00
B44C 1/22
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