04539217 is referenced by 62 patents.

A method and apparatus for measuring and compensating for neutral ions in an ion beam in the dose control system of an ion implanter. The gas pressure in the implantation volume (15) is measured, and the pressure signal is converted to an effective beam current signal in accordance with a known relationship among the gas pressure, the apparent beam current as measured by a Faraday cage and the neutral beam. The resulting effective beam current signal is inputted to the dose control system.

Title
Dose control method
Application Number
6/625263
Publication Number
4539217
Application Date
June 27, 1984
Publication Date
September 3, 1985
Inventor
Marvin Farley
Ipswich
MA, US
Agent
F M Sajovec
C H Grace
Assignee
Eaton Corporation
OH, US
IPC
B05D 3/06
View Original Source