04509852 is referenced by 864 patents and cites 5 patents.

Using a photolithographic projection apparatus a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

Title
Apparatus for the photolithographic manufacture of integrated circuit elements
Application Number
194422
Publication Number
4509852
Application Date
August 17, 1982
Publication Date
April 9, 1985
Inventor
Ernst W Lobach
Tonagass 374, Eschen
LI
Werner Tabarelli
Schlosstr. 5, Vaduz
LI
Agent
Herbert Dubno
Karl F Ross
IPC
G03B 27/52
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