04491628 is referenced by 561 patents and cites 14 patents.

Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.

Title
Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
Application Number
6/410201
Publication Number
4491628
Application Date
August 23, 1982
Publication Date
January 1, 1985
Inventor
Jean M J Frechet
Ottawa
CA
Carlton G Willson
San Jose
CA, US
Hiroshi Ito
San Jose
CA, US
Agent
Joseph G Walsh
Assignee
International Business Machines Corporation
NY, US
IPC
G03C 1/68
G03C 1/60
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