04480910 is referenced by 907 patents and cites 11 patents.

There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).

Title
Pattern forming apparatus
Application Number
6/358436
Publication Number
4480910
Application Date
March 15, 1982
Publication Date
November 6, 1984
Inventor
Yoshio Kawamura
Tokyo
JP
Sumio Hosaka
Hachioji
JP
Shinji Kuniyoshi
Tokyo
JP
Toshiei Kurosaki
Tokyo
JP
Yataro Kondo
Koganei
JP
Masamoto Akeyama
Kokubunji
JP
Tatsuo Harada
Fuchu
JP
Akihiro Takanashi
Kokubunji
JP
Agent
Antonelli Terry & Wands
Assignee
Hitachi
JP
IPC
G03B 27/68
G03B 27/52
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