04425146 is referenced by 28 patents and cites 9 patents.

Halides of Si and Ti, B, P, or Ge and oxygen or steam are introduced into a reaction vessel and heated in a vapor phase to form fine glass particles by oxidation or hydrolysis. The fine glass particles are deposited on a substrate. The deposited fine glass particles are heated and vitrified into a transparent glass layer, which is etched to form a core having a desired pattern by a reactive sputter etching process using Freon gas. The core is coated by a clad. In a waveguide thus formed, the cross sectional configuration and dimensions of the core layer and the refractive index difference are precisely controlled. The waveguide is manufactured with good reproducibility. The fabrication method is suitable for mass production of waveguides. An expansion coefficient transient layer is provided between the core layer and the substrate to prevent a crack in the waveguide. The glass softening temperature of the cladding layer is set lower than that of the core layer, so that the cross sectional configuration and dimensions of the core layer is unchanged against the heat in the vitrification process of the cladding layer. The refractive index is reduced in the vicinity of the boundary between the core and clad to prevent the loss of light due to light scattering on the core side faces.

Title
Method of making glass waveguide for optical circuit
Application Number
6/213069
Publication Number
4425146
Application Date
December 4, 1980
Publication Date
January 10, 1984
Inventor
Yasuji Murakami
Tokorozawa
JP
Nobuo Shimizu
Iruma
JP
Hidefumi Mori
Tokyo
JP
Tatsuo Izawa
Musashino
JP
Agent
Spencer & Frank
Assignee
Nippon Telegraph & Telephone Public Corporation
JP
IPC
C03B 19/00
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