04412388 is referenced by 2 patents and cites 6 patents.

A method for drying semiconductor substrates wherein a plurality of semiconductor substrates are irradiated with electromagnetic waves emitted from a waveguide in a non-reactive atmosphere of normal atmospheric pressure while the semiconductor substrates are positioned so that the predominant faces thereof substantially form right angles to the face of an opening of the waveguide.

Title
Method for drying semiconductor substrates
Application Number
6/218802
Publication Number
4412388
Application Date
December 22, 1980
Publication Date
November 1, 1983
Inventor
Hajime Kamioka
Yokohama
JP
Mikio Takagi
Kawasaki
JP
Agent
Staas & Halsey
Assignee
Fujitsu
JP
IPC
F26B 3/34
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