04371587 is referenced by 67 patents and cites 20 patents.

The specification discloses a low temperature process for depositing oxide layers on a substrate by photochemical vapor deposition, by exposing the substrate to a selected vapor phase reactant in the presence of photochemically generated neutral (un-ionized) oxygen atoms. The oxygen atoms react with the vapor phase reactant to form the desired oxide, which deposits as a layer on the substrate. The use of photochemically generated neutral oxygen atoms avoids damage to the substrate due to charge bombardment or radiation bombardment of the substrate. The deposited oxide layer may optionally incorporate a selected dopant material in order to modify the physical, electrical, or optical characteristics of the oxide layer.

Title
Low temperature process for depositing oxide layers by photochemical vapor deposition
Application Number
104323
Publication Number
4371587
Application Date
March 26, 1981
Publication Date
February 1, 1983
Inventor
John W Peters
Malibu
CA, US
Agent
A W Karambelas
William J Bethurum
Mary E Lachman
Assignee
Hughes Aircraft Company
CA, US
IPC
B32B 13/04
B32B 9/04
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