04369031 is referenced by 98 patents and cites 6 patents.

A gas flow control system in which several constituent gases are mixed and the mixture delivered through controlled injectors to a processing zone. Mass flow controllers control the injector flows with one of the controllers being a master and the other being slaved to provide a selected percentage of the flow through the master controller. The gas mix is regulated by a mass flow controller on one of the constituents and a flow meter on the other, the flow meter producing an error signal which is used to readjust the total flow through the injectors by control of the master injector flow controller.

Title
Gas control system for chemical vapor deposition system
Application Number
6/302003
Publication Number
4369031
Application Date
September 15, 1981
Publication Date
January 18, 1983
Inventor
Robert E Rappaport
Westminster
CA, US
Jon C Goldman
Orange
CA, US
Agent
Clifford A Dean
Neil M Rose
George R Clark
Assignee
Thermco Products Corporation
CA, US
IPC
B05C 19/02
F27D 19/00
F27B 5/04
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