04346164 is referenced by 1003 patents and cites 1 patents.

In a photolithographic method for the manufacture of integrated circuits a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

Title
Photolithographic method for the manufacture of integrated circuits
Application Number
6/194422
Publication Number
4346164
Application Date
October 6, 1980
Publication Date
August 24, 1982
Inventor
Ernst W Lobach
Tonagass 374, Eschen
LI
Werner Tabarelli
Schlossstr. 5, Vaduz
LI
Agent
Karl F Ross
IPC
G03C 5/00
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