04231811 is referenced by 69 patents and cites 9 patents.

A process for forming with a single masking step regions of different thicknesses in a photo-sensitive layer is disclosed. A masking member or reticle includes opaque and transparent areas and areas with a grating. The pitch of the periodic grating is of a lesser dimension than can be resolved by the masking projection apparatus. The photo-sensitive region illuminated by the grating receives uniform illumination at an intermediate intensity, thereby providing, after developing, a layer with regions of intermediate thickness.

Title
Variable thickness self-aligned photoresist process
Application Number
6/75095
Publication Number
4231811
Application Date
September 13, 1979
Publication Date
November 4, 1980
Inventor
C Norman Ahlquist
Menlo Park
CA, US
Sasson Somekh
Redwood City
CA, US
Agent
Blakely Sokoloff Taylor & Zafman
Assignee
Intel Corporation
CA, US
IPC
H01L 21/26
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