04138306 is referenced by 123 patents and cites 3 patents.

Apparatus for the treatment of semiconductors comprises a reaction chamber for effecting the vapor phase reaction of semiconductor substrates, means for introducing a vapor phase reaction gas into the reaction chamber, a plasma generating section, means for introducing into the plasma generating section a gas suitable for the plasma treatment of the inside of the reaction chamber, microwave power applying means for activating the gas contained in the plasma generating section, conduit means for introducing the activated gas into the reaction chamber, and evacuation means, whereby the undesired deposits formed on the parts other than the semiconductor substrates can be removed easily.

Title
Apparatus for the treatment of semiconductors
Application Number
5/828812
Publication Number
4138306
Application Date
August 29, 1977
Publication Date
February 6, 1979
Inventor
Kazuo Niwa
Yokohama
JP
Agent
Finnegan Henderson Farabow & Garrett
Assignee
Tokyo Shibaura Electric
JP
IPC
C03C 25/06
C03C 15/00
B44C 1/22
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