04134817 is referenced by 23 patents and cites 5 patents.

In the manufacture of electronic components, a thin film is attacked by decomposition of a gas in a plasma. The thin film is mounted on a substrate which is RF biased with respect to the plasma thereby attracting fluorine ions for example which carry out the attack. This speeds the rate of attack and improves the definition of attacked portions of the substrate.

Title
Method of attacking a thin film by decomposition of a gas in a plasma
Application Number
5/868239
Publication Number
4134817
Application Date
January 10, 1978
Publication Date
January 16, 1979
Inventor
Bernard Bourdon
Orsay
FR
Agent
Sughrue Rothwell Mion Zinn and Macpeak
Assignee
Alsthom Atlantique
FR
IPC
C23C 15/00
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