04105810 is referenced by 36 patents and cites 7 patents.

An alkyl compound of zinc is reacted with alkyl compounds or alkoxyl compounds of boron and silicon in the presence of oxygen, thereby to deposit on a substrate zinc borosilicate glass film through a chemical vapor deposition process. The outlet nozzle of a raw material supply conduit for introducing the raw material compounds into a reaction zone is opened in the direction substantially in parallel with a surface of the substrate on which the glass film is to be deposited so that raw materials may be well mixed at the reaction zone. The glass film thus produced has a uniform thickness and a homogeneous composition of the constituents over an area at least of 40 mm extending from the nozzle and is suited for use as protection films for semiconductor devices and dielectric layer for a thin film capacitor on an industrial base.

Title
Chemical vapor deposition methods of depositing zinc boro-silicated glasses
Application Number
5/692369
Publication Number
4105810
Application Date
June 3, 1976
Publication Date
August 8, 1978
Inventor
Tetuo Kosugi
Ibaraki
JP
Yoko Wakui
Hitachi
JP
Takeo Yamazaki
Hitachi
JP
Agent
Craig & Antonelli
Assignee
Hitachi
JP
IPC
C23C 11/08
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