04098923 is referenced by 53 patents and cites 9 patents.

Silicon dioxide is pyrolytically deposited by the reaction of silane with oxygen on vertically mounted substrates in an evacuated system. A standard diffusion furnace equipped with a furnace tube which is vacuum tight is used. Injection tubes having multiple injection ports are positioned within the furnace tube to distribute the silane and the oxygen uniformly across a plurality of substrates which are positioned perpendicular to the furnace tube axis in a boat covered with a perforated shroud. The process is particularly useful in providing for the low temperature deposition of uniform layers of silicon dioxide on silicon wafers to be used in the fabrication of semiconductor devices.

Title
Pyrolytic deposition of silicon dioxide on semiconductors using a shrouded boat
Application Number
5/693382
Publication Number
4098923
Application Date
June 7, 1976
Publication Date
July 4, 1978
Inventor
Jon Charles Goldman
Tempe
AZ, US
Robert Stanley Alberti
Tempe
AZ, US
Agent
John A Fisher
Assignee
Motorola
IL, US
IPC
B05D 5/12
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