04044222 is referenced by 50 patents and cites 5 patents.

An energy beam, such as the coherent output of a laser, is applied to a thin film in a controlled manner, preferably as a pluse. The length of the pulse is regulated to form a tapered aperture in the film. The duration, energy and wavelength of the beam pulse with respect to the thickness, thermal properties and optical properties of the film are such that impingement of the beam pulse on a first surface of the film results in controlled removal of a small amount of the film. The pulse is terminated before the temperature gradient between the first film surface and a second film surface (the film's thickness being bounded by the surfaces) is zero. Plural pulses may be serially applied to form the tapered aperture to a desired depth.

Typically, the thin films range in thickness from several hundred angstroms (.about.400A.) to about 10,000A. and may be dielectrics (SiO.sub.2, Si.sub.3 N.sub.4, Ta.sub.2 O.sub.5), metals (Au, Al, Ta, etc.) and silicon.

Relative motion of the pulsed beam and the film produces a pattern of tapered holes or, alternatively, a tapered kerf or moat.

Title
Method of forming tapered apertures in thin films with an energy beam
Application Number
5/649766
Publication Number
4044222
Application Date
January 16, 1976
Publication Date
August 23, 1977
Inventor
Ami Kestenbaum
East Windsor Township, Mercer County
NJ, US
Agent
J Rosenstock
Assignee
Western Electric Company
NY, US
IPC
B23K 9/00
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