The invention relates to a method 10 for forming a multi-level surface on a substrate 2, wherein said surface comprises areas of different wettability, the method comprising the step (A, B) of applying a multi-level stamp to the substrate for forming the multi-level surface, said multi-level stamp having different structural regions 1a arranged along the multi-level surface for locally altering wettability properties of at least a portion of a level of the multi-level surface 2a, 2b. The invention further relates to a semiconductor device and a method for manufacturing a semi-conductor device.

Method for forming a multi-level surface on a substrate with areas of different wettability and a semiconductor device having the same
Application Number
Publication Number
Application Date
November 13, 2009
Publication Date
November 3, 2011
Erwin Rinaldo Meinders
Maria Peter
H01L 21/30
B29C 59/02
H01L 33/02
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