Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Title
System and Method for Using a Two Part Cover and a Box for Protecting a Reticle
Application Number
12/882712
Publication Number
20110001955
Application Date
September 15, 2010
Publication Date
January 6, 2011
Inventor
Jonathan H Feroce
Shelton
CT, US
Woodrow J Olson
Stamford
CT, US
Abdullah Alikhan
Danbury
CT, US
Duane P Kish
Danbury
CT, US
Andrew Massar
Monroe
CT, US
Erik R Loopstra
Santiago del Puerto
Milton
NY, US
Agent
Sterne Kessler Goldstein & Fox Pllc
DC, US
Assignee
ASML Holding
IPC
G02B 07/00
G03B 27/62
G03B 27/58
View Original Source