Certain organometallic compounds in the form of imino complexes are provided. Such complexes are particularly suitable for use as vapor deposition precursors. Also provided are methods of depositing thin films, such as by ALD and CVD, using such compounds.

Title
Organometallic compounds
Application Number
11/540071
Publication Number
20080026576
Application Date
September 29, 2006
Publication Date
January 31, 2008
Inventor
Qing Min Wang
North Andover
MA, US
Deodatta Vinayak Shenai Khatkhate
Danvers
MA, US
Agent
Rohm And Haas Electronic Materials
MA, US
Assignee
Rohm and Haas Electronic Materials
MA, US
IPC
H01L 21/44
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