Chloropolysilanes are utilized in methods and systems for selectively depositing thin films useful for the fabrication of various devices such as microelectronic and/or microelectromechanical systems (MEMS).

Title
Methods and systems for selectively depositing si-containing films using chloropolysilanes
Application Number
11/753370
Publication Number
20080026149
Application Date
May 24, 2007
Publication Date
January 31, 2008
Inventor
Matthew D Stephens
Morristown
NJ, US
Jianqing Wen
Scottsdale
AZ, US
Ronald Bertram
Gilbert
AZ, US
Nyles Cody
Tempe
AZ, US
Matthias Bauer
Phoenix
AZ, US
Chantal Arena
Mesa
AZ, US
Pierre Tomasini
Tempe
AZ, US
Agent
Knobbe Martens Olsen & Bear
CA, US
Assignee
ASM America
AZ, US
IPC
C23C 16/00
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