An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer of formula I, wherein 1≦x≦2; 1≦y≦5; 1≧0; m>0; n>0; R is a chromophore, M is a metal selected from Group IIIB to Group VIB, lanthanides, Group IIIA, Group IVA except silicon; and L is an optional ligand. The invention is also directed to a process of making a lithographic structure including a silicon-metal oxide, antireflective material.

Title
Antireflective composition and process of making a lithographic structure
Application Number
11/180788
Publication Number
20070015083
Application Date
July 14, 2005
Publication Date
January 18, 2007
Inventor
Karen Temple
Dirk Pfeiffer
Dobbs Ferry
NY, US
Arpan P Mahorowala
Bronxville
NY, US
Elbert E Huang
Tarrytown
NY, US
Sean D Burns
Hopewell Junction
NY, US
Katherina E Babich
Chappaqua
NY, US
Agent
Connolly Bove Lodge & Hutz
DE, US
Assignee
International Business Machines Corporation
NY, US
IPC
G03C 01/00
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