20030106490-A1 is referenced by 5 patents.

Method and apparatus for depositing layers by atomic layer deposition. A virtual shower curtain is established between the substrate support and chamber to minimize the volume in which the reactants are distributed. A showerhead may be used to allow closer placement of the substrate thereto, further reducing the reaction volume. Zero dead space volume valves with close placement to the chamber lid and fast cycle times also improve the cycle times of the process.

Title
Apparatus and method for fast-cycle atomic layer deposition
Application Number
10/215068
Publication Number
20030106490
Application Date
August 7, 2002
Publication Date
June 12, 2003
Inventor
Daniel A Carl
Pleasanton
CA, US
Liang Yuh Chen
Foster City
CA, US
Jun Zhao
Cupertino
CA, US
Alain Duboust
Sunnyvale
CA, US
Shih Hung Li
Sunnyvale
CA, US
Ravi Jallepally
Santa Clara
CA, US
Agent
Applied Materials
CA, US
Assignee
Applied Materials
IPC
C30B 28/14
C30B 28/12
C30B 25/00
C30B 23/00
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