20020086106-A1 is referenced by 4 patents.

The apparatus for forming a thin film includes a reaction chamber having a top portion, a sidewall portion and a bottom portion; a gas injector penetrating the top portion and letting a source element pass therethrough; a distributor connected to the gas injector, wherein a plurality of injection holes are formed in the distributor and the source element is injected through the plurality of injection holes; and u substrate heating member positioned in a reaction space defined by the top, bottom and sidewall portions of the reaction chamber, and arranged below the distributor.

Title
Apparatus and method for thin film deposition
Application Number
10/039357
Publication Number
20020086106
Application Date
November 7, 2001
Publication Date
July 4, 2002
Inventor
Eung Soo Lee
Sang Young Oh
Bo Shin Chung
Jung Hwan Choi
Sang Gee Park
Chang Soo Park
Agent
Wildman Harrold Allen & Dixon
IL, US
IPC
C23C 16/00
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