20020003216-A1 is referenced by 3 patents.

The exposure apparatus comprises a projection optical system that has an image field capable of exposing a shot area in a scanning exposure apparatus in one shot. This allows a 1 in 1 exposure, with the shot area being the maximum exposable range of the scanning exposure apparatus. In addition, the main control unit changes the control factor of the exposure system contributing to the throughput, in accordance with the minimum line width of the pattern. The control factor is changed so that the state (or the value) moves into a state where more priority is put on throughput, only when reduction in exposure accuracy is allowed. This makes it possible to improve the throughput while maintaining the exposure accuracy, compared with the case when the exposure system is controlled based on the same value at all times.

Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method
Application Number
Publication Number
Application Date
July 6, 2001
Publication Date
January 10, 2002
Tsuneo Miyai
Yoshiki Kida
Oblon Spivak Mcclelland Maier & Neustadt PC
Nikon Corporation
G01N 21/86
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