251278 is referenced by 1 patents.

It is provided that a reflection plate of semiconductor heat treatment, which is resistant to cracks or deformations by controlling the adsorption of foreign materials and the production of reaction. Said reflection plate 1 for semiconductor heat treatment is composed of a disk-shaped or ring-shaped plate of optically transmissible material and a plate 2 of inorganic material hermetically enclosed in said disk-shaped or ring-shaped plate, in which said plate of inorganic material has at least one side in contact with said plate of optically transmissible material, said at least one side 2a having a surface roughness of Ra 0.1 to 10.0 ν, said at least one side 2a formed grooves 2c therein.

Reflection plate for semiconductor heat treatment and manufacturing method thereof
Application Number
Publication Number
Application Date
March 27, 2003
Publication Date
March 11, 2006
Saitom Takanori
Yokoyama Hideyuki
Saito Norihiko
Honma Hiroyuki
Shimanuki Kazuhiko
Tokyo Electron
Toshiba Ceramics
H01L 021/324