A method for designing potential correction thin film of optical pick-up for optical disk is provided that reduces a phase difference between P wave and S wave produced when a beam is totally reflected on a total reflection surface of a romvoid prism. The method in which in designing a phase correction thin film on a total reflection surface of a romvoid prism which coats a high refractivity substance and low refractivity substance in order of three layers of high refraction, low refraction and high refraction so as to reduce a phase difference between P wave and S wave produced when a beam is totally reflected on the total reflection surface of a romvoid prism, the thin film is coated where designing wavelength (lambda 0) is (1.032 +or- 02) times to the actual wavelength (lambda), an optical thickness(x) of the first layer is H(0.25 lambda 0), an optical thickness of the second layer(y) is L(0.25 lambda 0), an optical thickness(z)) of the third layer is (2.80.1) times of the optical thickness.

Title
Method for designing potential correction thin film of optical pick-up for optical disk
Application Number
1019940015639
Publication Number
100131372
Application Date
June 30, 1994
Publication Date
November 29, 1997
Inventor
Choi Chol Jae
Assignee
Hyundai Electronics
IPC
G11B 07/13