2006-216616 is referenced by 9 patents.

PROBLEM TO BE SOLVED: To provide a semiconductor device containing a solid-state image pickup element for forming a mask on a region exceeding the limit of mask fining, reducing the number of processes, and improving reliability, and also to provide a method for manufacturing the semiconductor device.SOLUTION: The semiconductor device has an element separation region 23 by an impurity region, and a mask 29 for obstructing ion implantation remains on the element separation region 23. A mask 29 for obstructing ion implantation is formed with the component of a semiconductor element, for example with the same configuration as a gate control section 25 in a MOS transistor.

Semiconductor device and manufacturing method thereof, and solid-state image pickup element and manufacturing method thereof
Application Number
Publication Number
Application Date
February 1, 2005
Publication Date
August 17, 2006
Taya Keiji
Yamamoto Atsuhiko
Ohashi Masanori
Itonaga Soichiro
Abe Hideji
Maruyama Shunsuke
H04N 05/335
H01L 27/146