2006-216616 is referenced by 9 patents.

PROBLEM TO BE SOLVED: To provide a semiconductor device containing a solid-state image pickup element for forming a mask on a region exceeding the limit of mask fining, reducing the number of processes, and improving reliability, and also to provide a method for manufacturing the semiconductor device.SOLUTION: The semiconductor device has an element separation region 23 by an impurity region, and a mask 29 for obstructing ion implantation remains on the element separation region 23. A mask 29 for obstructing ion implantation is formed with the component of a semiconductor element, for example with the same configuration as a gate control section 25 in a MOS transistor.

Title
Semiconductor device and manufacturing method thereof, and solid-state image pickup element and manufacturing method thereof
Application Number
2005-025527
Publication Number
2006-216616
Application Date
February 1, 2005
Publication Date
August 17, 2006
Inventor
Taya Keiji
Yamamoto Atsuhiko
Ohashi Masanori
Itonaga Soichiro
Abe Hideji
Maruyama Shunsuke
Assignee
Sony
IPC
H04N 05/335
H01L 27/146