2006-165500 is referenced by 29 patents.

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of performing satisfactory exposure processing while maintaining a liquid immersion region in a desired state.SOLUTION: The exposure apparatus EX irradiates a board (P) with exposure light EL via a projection optical system PL and a liquid LQ to expose the board P. The exposure apparatus EX is provided with a liquid immersion mechanism 1 for supplying the liquid LQ and recovering the liquid LQ. The liquid immersion mechanism 1 has an inclined plane 2 formed so as to face the front surface of the board P, and a liquid recovering port 22 of the liquid immersion mechanism 1 is formed on the inclined plane 2.

Exposure apparatus, exposure method, and device manufacturing method
Application Number
Publication Number
Application Date
June 9, 2005
Publication Date
June 22, 2006
Okuyama Takeshi
Nagasaka Hiroyuki
Nikon Engineering
G03F 07/20
H01L 21/027