2006-165500 is referenced by 29 patents.

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of performing satisfactory exposure processing while maintaining a liquid immersion region in a desired state.SOLUTION: The exposure apparatus EX irradiates a board (P) with exposure light EL via a projection optical system PL and a liquid LQ to expose the board P. The exposure apparatus EX is provided with a liquid immersion mechanism 1 for supplying the liquid LQ and recovering the liquid LQ. The liquid immersion mechanism 1 has an inclined plane 2 formed so as to face the front surface of the board P, and a liquid recovering port 22 of the liquid immersion mechanism 1 is formed on the inclined plane 2.

Title
Exposure apparatus, exposure method, and device manufacturing method
Application Number
2005-169549
Publication Number
2006-165500
Application Date
June 9, 2005
Publication Date
June 22, 2006
Inventor
Okuyama Takeshi
Nagasaka Hiroyuki
Assignee
Nikon Engineering
Nikon
IPC
G03F 07/20
H01L 21/027