Title
[fr] PROCÉDÉ DE POLISSAGE MÉCANO-CHIMIQUE DE SUBSTRATS CONTENANT DES FILMS DIÉLECTRIQUES DOXYDE DE SILICIUM ET DES FILMS DE POLYSILICIUM ET/OU DE NITRURE DE SILICIUM
[de] VERFAHREN ZUM CHEMISCH-MECHANISCHEN POLIEREN VON SUBSTRATEN MIT DIELEKTRISCHEN SILIZIUMOXID-FILMEN UND POLYSILIZIUM- UND/ODER SILIZIUMNITRID-FILMEN
[en] PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS
Application Number
EP20110823141
Publication Number
2613910 (A1)
Application Date
September 6, 2011
Publication Date
July 17, 2013
Inventor
PINDER HARVEY WAYNE
US
VENKATARAMAN SHYAM SUNDAR
TW
LI YUZHUO
DE
Assignee
BASF SE
DE
IPC
C11D 7/32
B24B 7/30
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