1646075-A1 is referenced by 6 patents and cites 3 patents.

An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes: a liquid supply mechanism that has a supply port arranged to oppose a surface of the substrate; and a buffer space formed in a channel of the liquid supply mechanism; wherein the liquid is supplied to the supply port after reserving a prescribed amount or more of liquid in the buffer space.

Title
Exposure apparatus and method for manufacturing device
Application Number
EP20040747523 20040708
Publication Number
1646075 (A1)
Application Date
July 8, 2004
Publication Date
April 12, 2006
Inventor
Okuyama Takeshi
JP
Nagasaka Hiroyuki
JP
Assignee
Nikon Engineering
JP
Nippon Kogaku
JP
IPC
G03F 07/20
H01L 21/027
G03F 07/20
G03F 07/20
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