0589049-A1 is referenced by 3 patents.

A thin polysilicon film produced by dispersing a granular product of SiOx (where O < x </= 2) with a size of 100 ANGSTROM or less on, for example, a glass substrate at a density of 100 particles or less in a square with a side of 0.1 mu m and then growing a thin polysilicon film with the granular product serving as a nucleus.

Title
Thin polysilicon film and production thereof.
Application Number
EP19930906804 19930323
Publication Number
0589049 (A1)
Application Date
March 23, 1993
Publication Date
March 30, 1994
Inventor
Yamamoto Kenji
JP
Assignee
Kanegafuchi Chemical
JP
IPC
C04B 41/82
C03C 17/22
C03C 17/22
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