Compositions including germanium compounds suitable for use as vapor phase deposition precursors for germanium-containing films are provided. Methods of depositing films containing germanium using such compositions are also provided. Such germanium-containing films are particularly useful in the manufacture of electronic devices.

Title
Organometallic composition
Application Number
200610167560
Publication Number
1986877
Application Date
December 18, 2006
Publication Date
June 27, 2007
Inventor
Woelk Egbert
Shenai Khatkhate Deodatta Vina
Agent
shayong sheng
Assignee
Rohm And Haas Electronic Mater
IPC
C23C 16/448
C23C 16/30