An apparatus and method for treating a thin film on a substrate is presented. The substrate is loaded on a fixed stage adapted to receive the substrate. An energy source is aligned through a space in a gas shield so as to face a thin film on the substrate to be repaired after the substrate is loaded. A protective insulating layer is removed by radiation from the energy source, a reaction gas is supplied to the space, and an open and/or short circuit in the thin film is repaired. The energy source and/or gas shield is moved during the repair, rather than the stage. If the energy source and gas shield are both moved, they are moved in opposite directions, either independently or dependent on each other, by first and second operating units, respectively.

Title
Apparatus for treating thin film and method of treating thin film
Application Number
200510109062
Publication Number
1796599
Application Date
October 17, 2005
Publication Date
July 5, 2006
Inventor
Park Sang Hyuck
Lee Jong Chul
Agent
xu jinguo qi jianguo
Assignee
Lg Philips Lcd
IPC
C23C 16/54
C23C 16/00